Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment

Brazilian Journal of Physics v. 46, n. 1, p. 56-69, 2016 1.042 10.1007/s13538-015-0383-2 Grigorov, K. G.; Chiappim, W.; Testoni, G. E.; Lima, J. S. B.; Medeiros, H. S.; Pessoa, R. S.; Vieira, L.; Maciel, H. S. 2016