The Nanofabrication Laboratory focuses on the development of nanodevices. Its facilities offer an advanced clean room infrastructure (100 m2) with ISO 6 and ISO 7 class environments designed for electron beam lithography processes, ion milling, resin deposition chambers, and instrumentation for process metrology and quality control.

Specifications

• Beam energy: 20 eV – 30 keV;
• Beam size: ≤ 1.6 nm at 20 keV;
• Current: 5 pA – 20 nA;
• Writing speed: 0.125 Hz – 20 MHz;
• Sample size: ≤100mm;
• SEM;
• EDS;
• electrical characterization
• Source: https://www.raith.com/product/eline-plus

Specifications

• Substrate Size: Up to 100mm diameter wafers;
• Maximum speed: 9,900 rpm;
• Vacuum: mechanical pump;
• Cleaning and revealing polypropylene fume hood.