CORROSION

The corrosion process consists of removing material from a substrate. This technique is widely used in the manufacture of electromechanical and optical devices, processors, memories, among others. There are two types of processes that are known as wet etching, or wet etching, and dry etching, or dry etching. These two types produce different anisotropy effects in most cases. The dry corrosion process can be carried out by physical removal, also known as sputtering, by chemical removal, also known as etching, or by a combination of the two. It is possible to control the corrosion rate (Å) through parameters such as pressure (torr), temperature (°C) and power (W).

O2 plasma

It is also possible to carry out organic material removal processes by means of oxygen plasma. In this case, oxygen ions react with the organic matter present on the surface of the sample. This process is widely used for sample cleaning before and after photolithography processes, as well as for sealing processes of polymer-based microfluidic devices (PDMS).

Equipment

Wet corrosion

  • Corrosion with hydrofluoric acid (HF);
  • Cleaning with Piranha solution;
  • RCA cleaning.

ATC ORION SERIES Ion Milling – AJA International, Inc.

  • Sample Size: Up to 100mm in diameter;
  • Gas: Argon;
  • Source: Kaufman KDC 75;
  • Operating voltage: 100 – 1200 V;
  • Temperature: 5°C to 40°C.

RIE – Plasma Pro NGP80 – Oxford Instruments

  • Substrate Size: It is possible to corrode from 8mm x 8mm samples up to 100mm diameter wafers;
  • Available gases: CF4, SF6, CHF3, O2, Ar;
  • In the induction plasma configuration (ICP-RIE), the maximum sample size is 50 mm;
  • Dedicated Silicon Corrosion System

Capacitive Plasma Corrosion - Diener

  • Available gases: O2, Ar, N2;
  • Substrate size: ≥ 100mm;
  • Frequency: 100 kHz and 13.56 MHz;
  • Power: 0 – 500 W (100 kHz)
  • 0 – 300 W (13.56 MHz).

Capacitive Plasma Corrosion

  • Available gases: O2, Ar, N2;
  • Substrate size: ≥ 100mm;
  • Frequency: 100 kHz and 13.56 MHz;
  • Power: 0 – 500 W (100 kHz)
  • 0 – 300 W (13.56 MHz).