DEVICE MANUFACTURINGLNNano’s Nano and Microfabrication division offers an open, multiuser infrastructure for research and development of devices for the most diverse applications, created to support the scientific and industrial communities. Processing includes cleaning and etching steps, photo and nanolithography*, direct writing, thin-film deposition, 3D printing and a complete platform for microfluidic device fabrication.
All facilities have access by appointment, a highly trained team in the available techniques, support and guidance at all stages of the processes.
In addition to all the infrastructure available for the manufacture of devices and sensors, the division has a park of equipment dedicated to electrical characterization, and it is also possible to carry out measurements with variations in temperature and magnetic field
(min 50 mK and ± 14 T field).
The laboratory also has facilities for sample preparation such as precision cutting with diamond discs and micro-welding for connecting devices. For topological characterization, the division has a confocal laser microscope (LSCM), with a fixed wavelength at 408 nm (violet), which can be used as a complementary technique to electron and atomic force microscopy (MEV and AFM).
Although samples with high roughness are unfeasible for analysis with AFM and with SEM, as it is impossible to extract quantitative data, with the VK-X200 tool, it is possible to analyze rough surfaces with a high spatial resolution (up to 10nm on the z-axis). Furthermore, it is possible to extract a three-dimensional map of the analyzed region, obtaining data such as profile and roughness. Other topological analysis techniques are also available, such as contact profilometry, where a probe with a radius of up to 6.5 µm is used to interact with the substrate surface and extract profile and roughness parameters.