NANOFABRICATIONEquipment
Electron Beam Lithography
- Beam energy: 20 eV – 30 keV;
- Beam size: ≤ 1.6 nm at 20 keV;
- Current: 5 pA – 20 nA;
- Writing speed: 0.125 Hz – 20 MHz;
- Sample size: ≤100mm;
- Availability of electron-resist to positive and negative types
Resin spreading/cleaning/development
- Substrate Size: Up to 100mm diameter wafers;
- Maximum speed: 9,900 rpm;
- Vacuum: mechanical pump;
- Cleaning and revealing polypropylene fume hood.
Electron Beam Lithography
- Beam energy: 20 eV – 30 keV;
- Beam size: ≤ 1.6 nm at 20 keV;
- Current: 5 pA – 20 nA;
- Writing speed: 0.125 Hz – 20 MHz;
- Sample size: ≤100mm;
- SEM;
- EDS;
electrical characterization
Source: https://www.raith.com/product/eline-plus
Commissioned until June 2021
Resin spreading/cleaning/development
- Substrate Size: Up to 100mm diameter wafers;
- Maximum speed: 9,900 rpm;
- Vacuum: mechanical pump;
- Cleaning and revealing polypropylene fume hood.