LNNano - Brazilian Nanotechnology National Laboratory

Karl Suss MJB3 – Mask Aligner

Print this pageShare on FacebookTweet about this on TwitterEmail this to someoneShare on LinkedIn

  • Capable of processing wafers up to 3-inch
  • Configured for Top Side Alignment (TSA)
  • 350W Lamphouse
  • Exposure Resolution: 1.5um (under optimal conditions)
  • Alignment Resolution: 0.25um (operator dependant)
  • Capable of Hard, Soft and Vacuum Contact Exposure Modes